24-Mar-2020 | Facts and Factors
Findings from Facts and Factors report “Nanoimprint Lithography System Market By Type (Hot Embossing (HE), UV-based Nanoimprint Lithography (UV-NIL), and Micro Contact Printing (µ-CP)), and By Application (Consumer Electronics, Optical Equipment, and Others): Global Industry Outlook, Market Size, Business Intelligence, Consumer Preferences, Statistical Surveys, Comprehensive Analysis, Historical Developments, Current Trends, and Forecasts, 2020–2026” states that the global Nanoimprint lithography system market in 2019 was above USD 79 million. The market is expected to grow above a CAGR of 8.9% and is anticipated to reach over USD 145 million by 2026.
The method used for the fabrication of nanometer-scale patterns is known as nanoimprint lithography. It is an easy nanolithography technique with less expensive, high resolution, and high throughput. It forms patterns through mechanical deformation of imprint resist and subsequent processes. Nanoimprint lithography is based on surface structuring with a template that consists of topographic patterns. Subsequent to imprinting, the patterns are required to be transferred in order to obtain various functions. As the lithography method, nanoimprint is completely compatible with the typical microfabrication method, which includes different transfer techniques such as selective re-growth, etching, lift-off, and diffusion.
The advantage associated with nanoimprint lithography is its sheer simplicity. At present, several versions of NIL are available such as Roll-to-Roll printing, UV wafer-scale NIL, Thermal wafer-scale NIL, and UV step and repeat NIL. Since the introduction of nanoimprint lithography, it is used in research as an easy, inexpensive, and high throughput technique used to replicate micro and nanoscale patterns. Owing to the benefits associated with the nanoimprint lithography system, it has been rapidly developed over the years as a promising option to conventional nanolithography processes to fulfill the demand of recent developments in semiconductor and flexible electronics industries.
Browse the full “Nanoimprint Lithography System Market By Type (Hot Embossing (HE), UV-based Nanoimprint Lithography (UV-NIL), and Micro Contact Printing (µ-CP)), and By Application (Consumer Electronics, Optical Equipment, and Others): Global Industry Outlook, Market Size, Business Intelligence, Consumer Preferences, Statistical Surveys, Comprehensive Analysis, Historical Developments, Current Trends, and Forecasts, 2020–2026" https://www.fnfresearch.com/nanoimprint-lithography-system-market-by-type-hot-embossing-912
Nanolithography is a simple process that offers high performance, high accuracy, high resolution, and low-cost efficiency. In commercial semiconductor production, this system is widely used. The increasing demand for NIL technology in different types of applications such as optical equipment, medical devices, consumer electronics, and others are driving the market growth. Smartphone manufacturers are planning to use NIL technology in order to improve memory efficiency and performance as nonprinting is capable of replacing features below 10 nm. NIL technology is also used for the manufacturing of optical features, such as optical grating or miniaturized lenses owing to its ability to imitate complex three-dimensional shapes in a single process. This technology also helps in biomedical applications, such as in the formation of textured surfaces as scale pattern surfaces. It is a new technique and provides the ability to form nanoscale patterns at low cost, this is expected to provide significant growth opportunities in the market. The common limitation of the NIL technique is the lack of flexibility. Moreover, another disadvantage is the flexibility of patterning. These disadvantages may restrain the market growth.
On the basis of types, hot embossing (HE) dominated the global nanoimprint lithography system market in 2019. It accounted for nearly USD 35 million in 2019 and is expected to grow over the forecast period.
Based on various applications, the global nanoimprint lithography system market was led by optical equipment. It accounted for nearly USD 40 million owing to the use of optical equipment to process the lightwave to enhance the images.
By geography, The Asia Pacific is expected to be the fastest-growing market for the nanoimprint lithography system in the years to come.
The top key players operating in the market are Obducat, EV Group, Canon, Nanonex, Suss Microtec, SuZhou GuangDuo Micro, Nano-Device Co., and others.
Report Scope
Report Attribute |
Details |
Market Size in 2019 |
USD 79 Million |
Projected Market Size in 2026 |
USD 145 Million |
Growth Rate |
CAGR 8.9% |
Base Year |
2019 |
Forecast Years |
2020-2026 |
Key Market Players |
EV Group, Canon, Obducat, Suss Microtec, Nanonex, Nano-Device Co., SuZhou GuangDuo Micro, and others. |
Key Segment |
By Type, By Application, By Region |
Major Regions Covered |
North America, Europe, Asia Pacific, Latin America, and the Middle East & Africa |
Purchase Options |
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This report segments the Nanoimprint lithography System market as follows:
Global Nanoimprint Lithography System Market: By Type Segmentation Analysis
- Hot Embossing (HE)
- UV-based Nanoimprint Lithography (UV-NIL)
- Micro Contact Printing (μ-CP)
Global Nanoimprint Lithography System Market: By Application Segmentation Analysis
- Consumer Electronics
- Optical Equipment
- Others
Global Nanoimprint Lithography System Market: Regional Segmentation Analysis
- North America
- Europe
- Germany
- The UK
- France
- Spain
- Italy
- Rest of Europe
- Asia Pacific
- China
- Japan
- India
- South Korea
- Southeast Asia
- Rest of Asia Pacific
- Latin America
- Brazil
- Mexico
- Rest of Latin America
- Middle East & Africa
- GCC
- South Africa
- Rest of the Middle East & Africa
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